Molecular Pathways for Defect Annihilation in Directed Self-Assembly
Su-Mi Hur,Vikram Thapar,Abelardo Ramirez-Hernandez,Gurdaman Khaira,Tamar Segal-Peretz,Paulina A. Rincon-Delgadillo,Weihua Li,Marcus Mueller,Paul F. Nealey,Juan J. de Pablo
DOI: https://doi.org/10.1073/pnas.1508225112
IF: 11.1
2015-01-01
Proceedings of the National Academy of Sciences
Abstract:Over the last few years, the directed self-assembly of block copolymers by surface patterns has transitioned from academic curiosity to viable contender for commercial fabrication of next-generation nanocircuits by lithography. Recently, it has become apparent that kinetics, and not only thermodynamics, plays a key role for the ability of a polymeric material to self-assemble into a perfect, defect-free ordered state. Perfection, in this context, implies not more than one defect, with characteristic dimensions on the order of 5 nm, over a sample area as large as 100 cm(2). In this work, we identify the key pathways and the corresponding free energy barriers for eliminating defects, and we demonstrate that an extraordinarily large thermodynamic driving force is not necessarily sufficient for their removal. By adopting a concerted computational and experimental approach, we explain the molecular origins of these barriers and how they depend on material characteristics, and we propose strategies designed to overcome them. The validity of our conclusions for industrially relevant patterning processes is established by relying on instruments and assembly lines that are only available at state-of-the-art fabrication facilities, and, through this confluence of fundamental and applied research, we are able to discern the evolution of morphology at the smallest relevant length scales-a handful of nanometers-and present a view of defect annihilation in directed self-assembly at an unprecedented level of detail.