Microstructural, Optical and Electrical Properties of Molybdenum Doped Zno Films Deposited by Magnetron Sputtering
Shiwei Shi,Gang He,Miao Zhang,Xueping Song,Junlei Li,Xiaoxiao Wang,Jingbiao Cui,Xiaoshuang Chen,Zhaoqi Sun
DOI: https://doi.org/10.1166/sam.2012.1272
2012-01-01
Science of Advanced Materials
Abstract:The undoped and molybdenum doped ZnO (MZO) films were deposited on quartz substrates by radio frequency magnetron sputtering. Mo-doping influences the grain size of the films and leads to a compressive stress in MZO films. XPS reveals that there is only Mo6+, no Mo5+ or Mo4+, in the MZO films. Mo doping introduces two effects on Zn 2p(3/2) XPS spectra, one is the decrease of binding energy of Zn 2p(3/2), and the other is the emergence of a smaller peak at 1022.0 eV in Zn 2p(3/2) spectrum. The optical bandgap of MZO films is in the range of 3.30-3.31 eV, larger than 3.29 eV of the undoped ZnO films. The resistivity of MZO films, which is in the range of 0.062-6.18 Omega cm, decreases first and then increases with the increase of Mo content. The resistivity of MZO films reaches the minimum when the Mo doping concentration is 2 wt.%. According to our observation, it can be supposed that proper doping level of Mo can stimulate the formation of Zn-i and prompt the conductivity of MZO films. Annealing in air causes a significant increase in resistivity of the MZO films, which can be attributed to the adsorption of oxygen and the concentration change of the donor defects Zn-i and its complexes defects in the annealing process.