Molecular Lithography Through DNA-Mediated Etching and Masking of SiO2

Sumedh P. Surwade,Shichao Zhao,Haitao Liu
DOI: https://doi.org/10.1021/ja2038886
IF: 15
2011-01-01
Journal of the American Chemical Society
Abstract:We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.
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