Characteristics of Subwavelength Photolithography Based on Surface Plasmon Polaritons

Weihao Ge,Yinfei Xue,Chinhua Wang,Bing Cao
DOI: https://doi.org/10.1117/12.870345
2010-01-01
Abstract:In this work, the characteristics of the subwavelength patterning through periodic metal gratings are discussed. By incorporating different structures of metal gratings, the quality improvements in subwavelength pattern generation are observed in terms of pattern resolution, uniformity and visibility. By using Ag and Al metals, a deep subwavelength (similar to lambda/12 and similar to lambda/9) pattern with sufficient visibility, and high uniformity can be achieved. The physical mechanism of the quality improvements based on surface-plasmon polaritons (SPPs) theory is discussed. Finite-difference time-domain analysis method is used in the simulation.
What problem does this paper attempt to address?