Abstract:Optically transparent, colorless Al-O-N and Al-Si-O-N coatings with discretely varied O and Si contents were fabricated by reactive direct current magnetron sputtering (R-DCMS) from elemental Al and Si targets and O2 and N2 reactive gases. The Si/Al content was adjusted through the electrical power on the Si and Al targets, while the O/N content was controlled through the O2 flow piped to the substrate in addition to the N2 flow at the targets. The structure and morphology of the coatings were studied by X-ray diffraction (XRD) and transmission electron microscopy (TEM), while the elemental composition was obtained from Rutherford backscattering spectrometry (RBS) and heavy ion elastic recoil detection analysis (ERDA). The chemical states of the elements in the coatings were analyzed by X-ray photoelectron spectroscopy (XPS). Based on analytical results, a model describing the microstructural evolution of the Al-O-N and also previously studied Al-Si-N [1, 2, 3, 4] coatings with O and Si content, respectively, is established. The universality of the microstructural evolution of these coatings with the concentration of the added element is attributed to the extra valence electron (e-) that must be incorporated into the AlN wurtzite host lattice. In the case of Al-O-N, this additional valence charge arises from the e - acceptor O replacing N in the AlN wurtzite lattice, while the e - donor Si substituting Al fulfills that role in the Al-Si-N system. In view of future applications of ternary Al-O-N and quaternary Al-Si-O-N transparent protective coatings, their mechanical properties such as residual stress (σ), hardness (HD) and Young's modulus (E) were obtained from the curvature of films deposited onto thin substrates and by nanoindentation, respectively. Moderate compressive stress levels between -0.2 and -0.5 GPa, which suppress crack formation and film-substrate delamination, could be obtained together with HD values around 25 GPa.

Optical and Mechanical Properties of Nanocrystalline Silicon Dioxide Films Prepared by Medium Frequency Magnetron Sputtering

Properties of amorphous SiO2 films prepared by reactive RF magnetron sputtering method

Optical Properties Study of Silicon Oxynitride Films Deposited by RF Magnetron Sputtering

Optical and Wetting Properties of CuAlO2 Films Prepared by Radio Frequency Magnetron Sputtering

Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Preparation and Photoluminescence of Nanocrystalline Si-Rich Silicon Oxide Films by Pecvd

Optical Properties of SiOx Film on Aluminum Substrate Prepared by APCVD

The Microstructure, Morphology, and Mechanical Properties of Sol-Gel-derived Amorphous Aluminum Oxide Films

Effects of deposition temperature on the mechanical and structural properties of amorphous Al-Si-O thin films prepared by RF magnetron sputtering

Understanding the microstructural evolution and mechanical properties of transparent Al-O-N and Al-Si-O-N films

Effect of sputtering power on the properties of SiO 2 films grown by radio frequency magnetron sputtering at room temperature

Effect of sputtering power on the properties of SiO2 films grown by radio frequency magnetron sputtering at room temperature

Properties of Si-rich SiO2 Films by RF Magnetron Sputtering

Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering

Measurements Of Microstructural, Chemical, Optical, And Electrical Properties Of Silicon-Oxygen-Nitrogen Films Prepared By Plasma-Enhanced Atomic Layer Deposition

Measurement and Analysis on the Mechanical Properties of Silicon Carbide Film

Ellipsometric Study of the Optical Properties of Silicon-Based Si : Sio2 Composite Thin Films under Different Annealing Temperatures

Effect Of Sputtering Pressure On The Structure And Properties Of Sio2 Films Prepared By Magnetron Sputtering

Effects of Composition and Thermal Annealing on the Mechanical Properties of Silicon Oxycarbide Films