Endogenous Endophthalmitis Associated With Intravenous Drug Use-Reply.

Aubrey R Tirpack,J. Duker,C. Baumal

DOI: https://doi.org/10.1001/jamaophthalmol.2017.4357

IF: 8.253

2017-12-01

JAMA Ophthalmology

Abstract:

What problem does this paper attempt to address?

Microscopic studies on transparent AlSiN ternary hard coating

Shahid Anwar,Sheeba Sonali,Sharmistha Anwar

DOI: https://doi.org/10.1016/j.ceramint.2023.02.048

IF: 5.532

2023-06-01

Ceramics International

Abstract:In this work AlSi nanocomposite coating were deposited by RF magnetron sputtering in Ar/N2 reactive atmosphere. AlSi alloy target of composition 86:14 wt % have been used to deposit the coating on float glass substrate by varying the deposition time: starting from 0.5 h to 2 h. The substrate temperature and target power were fixed at 250 °C and 100 W respectively. The effect of deposition time on microstructure, mechanical and optical property were studied by usingX-ray Diffraction (XRD), Stylus profiler, Field Emission Scanning Electron Microscope (FESEM), Energy Dispersive X-ray Spectroscopy (EDS), Transmission Electron Microscopy (TEM), UV–Visible Spectrometer and Nanoindentation techniques. The XRD shows the formation h-AlN phase for film deposited for 2 h which shows that with increase in deposition time, the film structure changes from amorphous to polycrystalline, the coating deposited for 2 h develops wurtzite-AlN nanocrystalline structure. The thickness of the coating increases with respect to the increasing deposition time which was confirmed from stylus profiler. The FESEM study shows the uneven and randomly oriented grains present in the coating. TEM study confirms the amorphous and polycrystalline nature of the films with low and high thickness respectively. The elemental composition was confirmed by EDS. UV–Visible Spectrometer delivers the optical transparency of the film which is >90% for all the coatings in the visible range spectra. The roughness of the samples was also measured from scanning probe microscope image, which showed average roughness (Rã) value below 2 nm. The maximum hardness obtained is 31 GPa for the coating deposited 2 h with 490 nm thickness, it has an elastic recovery of 92% which suggest its resistance to elasticity as well as plastic deformation.

materials science, ceramics
Microscopy evidences of nanocomposite structure in hard and optically transparent ternary AlSiN coating

Shahid Anwar,Sharmistha Anwar,Barsha Priyadarshini

DOI: https://doi.org/10.1016/j.tsf.2023.139891

IF: 2.1

2023-05-18

Thin Solid Films

Abstract:In this work AlSiN ternary coatings were deposited by radio frequency magnetron sputtering in Ar/N 2 reactive atmosphere. AlSi alloy target of composition 86:14 wt % have been used to deposit the coatings on float glass substrate by varying the Ar:N2 ratio i.e., 20:4, 20:6, 20:8, 20:13 and 20:15. The effect of different Ar:N 2 ratio on microstructure, mechanical and optical property were studied using x-ray diffraction (XRD), stylus profilometry, Field Emission Scanning Electron Microscopy (FESEM), Energy Dispersive X-ray Spectroscopy (EDS), High Resolution Transmission Electron Microscopy (HRTEM) , UV-visible spectrometry and manoindentation. The XRD measurements show the formation h-AlN phase for coating deposited for 20:6 only and confirm the crystalline nature of the coating whereas at higher and lower Ar: N 2 ratio, the measurements show the amorphous nature of the coatings. 20:6 deposited coating developed a wurtzite-AlN nanocrystalline structure. The thickness of the coatings decreased with respect to the increasing Ar: N 2 ratio. The FESEM shows uneven and dense microstructure of the coatings. HRTEM study confirms the amorphous nature of 20:4 and 20:13 Ar: N 2 ratio, and the polycrystalline nature of 20:6 coating. The elemental compositions were confirmed by EDS. The optical transparency of the coating was more than 95% for all the coatings in the visible range. The roughness of the samples was also measured in scanning probe microscopy imaging that showed an average roughness value Ra of ∼3 nm. The maximum hardness of 31 GPa was observed for the coating prepared with an Ar: N 2 ratio of 20:6.

materials science, multidisciplinary,physics, applied, condensed matter, coatings & films
Structural, surface electronic bonding, optical, and mechanical features of sputtering deposited CrNiN coatings with Si and Al additives

Tahrima Sathy,Hatem Taha,Khalil Ibrahim,M.Mahbubur Rahman,S.M.Amir-Al Zumahi,Nourin Arobi,Nusrat Jahan,Xiaoli Zhao,Humayun Kabir,Amun Amri,Zhi-feng Zhou,Zhong-Tao Jiang

DOI: https://doi.org/10.1016/j.matchemphys.2021.125289

IF: 4.778

2022-02-01

Materials Chemistry and Physics

Abstract:Herein, the closed field unbalanced magnetron sputtered CrNiN, CrNiSiN, and CrNiAlN coatings are studied to gain insights into their structural, morphological, optical, and mechanical properties. Detailed characterizations of the thin films have been carried out through X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), ultraviolet–visible–near infrared (UV–Vis) spectroscopy, nanoindentation, finite element modeling (FEM), and water contact angle measurements. XRD confirmed the hexagonal close-packed hcp-Cr2N (211) phase and face-centered cubic fcc-CrN (200) phase. The SEM images confirmed the compact, dense, and uniform distribution of gains in the coating structures. The average crystallite size of CrNiN coatings was 515 nm. The addition of substituents (Si and Al) to the CrNiN coatings resulted in increasing the crystallite sizes to 605 nm (for CrNiSiN) and 811 nm (for CrNiAlN) as well as grain size from 1.32 to 2.335 μm. XPS analysis was conducted to estimate the atomic constituents and measure the high-resolution XPS spectra of Ni2p photoelectron lines. The elastic modulus and hardness of the coatings are between 361 and 459 GPa, and 23.1–26.8 GPa, respectively. The Si, and Al additions enhanced both Young's modulus and the hardness of the coatings. Results of FEM modeling demonstrated the stress distribution within the coatings on steel and silicon substrates at different film thicknesses. The maximum stress level was increased by 30% at the coatings' upper portion, while that of the interface was reduced by 60%. The water contact angle values lay within the range of 102.4°–112.4°.

materials science, multidisciplinary
The Microstructure, Morphology, and Mechanical Properties of Sol-Gel-derived Amorphous Aluminum Oxide Films

Junteng Jin,Gaoling Zhao,Zhiqiang Cao,Bin Song,Gaorong Han

DOI: https://doi.org/10.1142/s2811086224500067

2024-01-01

Abstract:Amorphous alumina films are isotropic and have no grain boundaries, which make them have smooth surfaces, excellent properties, and wide applications in protective coatings, catalysis, and microelectronics. However, high-quality alumina films were usually prepared by vapor-phase approaches which need expensive equipment and long production time. Additionally, amorphous films are long-range disordered, which makes the study of structure–property relationships challenging. Here, a simple sol–gel method is employed to obtain high-quality amorphous Al2O3 thin films. The microstructure, morphology, and mechanical properties of amorphous Al2O3 thin films were systematically investigated. All the Al2O3 thin films heat-treated at 600–800∘C are in amorphous state with ultrasmooth surface (Ra values about 0.29–0.43 nm) and high mechanical properties (elastic modulus ∼170[Formula: see text]GPa, hardness ∼20[Formula: see text]GPa). The mechanical properties (E and H) of Al2O3 films gradually increase with the increase of heat-treating temperature. Additionally, the Al coordination of the amorphous alumina films are analyzed by solid-state NMR and correlated with the mechanical properties. The results show that in amorphous alumina, the presence of tetrahedral Al ([4]Al) and octahedral Al ([6]Al) is helpful to improve the mechanical properties, while the five-coordinated Al ([5]Al) is not conducive to improve the mechanical properties. The results demonstrate that sol–gel method is an attractive alternative to time-consuming and expensive vapor-phase approaches and are useful for scale-up to applications and research of amorphous alumina films.
Effects of deposition temperature on the mechanical and structural properties of amorphous Al-Si-O thin films prepared by RF magnetron sputtering

Stefan Karlsson,Per Eklund,Lars Österlund,Jens Birch,Sharafat Ali

2023-06-28

Abstract:Aluminosilicate (Al-Si-O) thin films containing up to 31 at. % Al and 23 at. % Si were prepared by reactive RF magnetron co-sputtering. Mechanical and structural properties were measured by indentation and specular reflectance infrared spectroscopy at varying Si sputtering target power and substrate temperature in the range 100 to 500 °C. It was found that an increased substrate temperature and Al/Si ratio give denser structure and consequently higher hardness (7.4 to 9.5 GPa) and reduced elastic modulus (85 to 93 GPa) while at the same time lower crack resistance (2.6 to 0.9 N). The intensity of the infrared Si-O-Si/Al asymmetric stretching vibrations shows a linear dependence with respect to Al concentration. The Al-O-Al vibrational band (at 1050 cm-1) shifts towards higher wavenumbers with increasing Al concentration which indicates a decrease of the bond length, evidencing denser structure and higher residual stress, which is supported by the increased hardness. The same Al-O-Al vibrational band (at 1050 cm-1) shifts towards lower wavenumber with increasing substrate temperature indicating an increase in the of the average coordination number of Al.

Materials Science,Applied Physics
Mechanical and Tribological Properties of Ta-N and Ta-Al-N Coatings Deposited by Reactive High Power Impulse Magnetron Sputtering

Valentina Zin,Francesco Montagner,Silvia Maria Deambrosis,Cecilia Mortalò,Lucio Litti,Moreno Meneghetti,Enrico Miorin

DOI: https://doi.org/10.3390/ma15093354

IF: 3.4

2022-05-08

Materials

Abstract:In this article, the depositions and functional characterizations of Ta-N and Ta-Al-N coatings for protection purposes, grown by reactive high-power impulse magnetron sputtering onto silicon substrates, are described. Nitride films were grown while changing the substrate polarization voltage (i.e., the applied bias voltage) during the process. Moreover, the effects of adding Al to form a ternary system and the resulting variation of the coatings' mechanical and tribological properties have been widely investigated by nanoindentation, scratch, and wear tests. Micro-Raman characterization has been applied to the wear tracks to explore the comprehensive tribo-environment and wear mechanism. Interestingly, Ta-Al-N films, despite significantly improved mechanical properties, show a premature failure with respect to Ta-N coatings. The wear mechanisms of Ta-N and Ta-Al-N systems were revealed to be very different. Indeed, Ta-Al-N films suffer higher oxidation phenomena during wear, with the formation of an oxidized surface tribofilm and a reduced wear resistance, while Ta-N coatings undergo plastic deformation at the wear surface, with a slightly adhesive effect.

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,metallurgy & metallurgical engineering
Influence of film structure on the microstructure and properties of TiAlN coatings on Al-Si alloys

Hongshuai Cao,Jiao Yang,Wenzhong Luo,Yuanhang Li,Fugang Qi,Nie Zhao,Liwei Lu,Xiaoping Ouyang

DOI: https://doi.org/10.1016/j.matchar.2022.111996

IF: 4.537

2022-07-01

Materials Characterization

Abstract:Due to the disadvantages of poor friction and low wear resistance, the application of Al-Si alloys with unique properties in pistons is limited. In this work, TiAlN ceramic coatings were prepared by filtered cathode vacuum arc technique to improve the surface properties of Al-Si alloys. To overcome the high residual stress of hard coatings growth on soft substrate surfaces due to interfacial mismatch and defect accumulation, gradient and multilayer film structures were adopted to improve adhesion strength. The effects of film structure on the microstructure, mechanical and tribological properties of coatings were systematically investigated. The results showed that the coatings with different film structures showed a multiphase microstructure with the dominated phase of TiAlN and a small amount of AlTi and TiN phases. Monolayer and multilayer coatings exhibited TiAlN (111) orientation, while the gradient coating showed (220) orientation due to the growth of columnar to equiaxed crystals. Compared with the monolayer coating, TiAlN coatings with gradient and multilayer structures had significantly reduced compressive stress and improved adhesion and scratch propagation resistance. Among them, the multilayer coating showed the lowest friction coefficient (~0.44) and wear rate (~5.14 × 10−5 mm3/Nm), which were attributed to the high hardness (~31.01 GPa), toughness (H/E = 0.135, H3/E2 = 0.563 GPa), critical load LC3 (~26.58 N). Interfacial effects in the multilayer structure could enhance synergy of the coating, thereby preventing crack initiation and propagation and adhesion failure.

materials science, multidisciplinary,metallurgy & metallurgical engineering, characterization & testing
Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering

Sharafat Ali,Biplab Paul,Roger Magnusson,Erik Ekström,Camille Pallier,Bo Jonson,Per Eklund,Jens Birch

DOI: https://doi.org/10.1016/j.surfcoat.2019.05.015

IF: 4.865

2019-08-01

Surface and Coatings Technology

Abstract:In this work, amorphous thin films in Mg-Si-O-N system typically containing >15 at.% Mg and 35 at.% N were prepared in order to investigate especially the dependence of optical and mechanical properties on Mg composition. Reactive RF magnetron co-sputtering from magnesium and silicon targets were used for the deposition of Mg-Si-O-N thin films. Films were deposited on float glass, silica wafers and sapphire substrates in an Ar, N2 and O2 gas mixture. X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, spectroscopic ellipsometry, and nanoindentation were employed to characterize the composition, surface morphology, and properties of the films. The films consist of N and Mg contents up to 40 at.% and 28 at.%, respectively and have good adhesion to substrates and are chemically inert. The thickness and roughness of the films increased with increasing content of Mg. Both hardness (16–21 GPa) and reduced elastic modulus (120–176 GPa) are strongly correlated with the amount of Mg content. The refractive index up to 2.01 and extinction coefficient up to 0.18 were found to increase with Mg content. The optical band gap (3.1–4.3) decreases with increasing the Mg content. Thin film deposited at substrate temperature of 100 °C shows a lower value of hardness (10 GPa), refractive index (1.75), and higher values of reduced elastic modulus (124 GPa) as compared to the thin film deposited at 310 °C and 510 °C respectively, under identical synthesis parameters.

physics, applied,materials science, coatings & films
Microstructure and Tribological Behavior of TiAlSiN Coatings Deposited by Deep Oscillation Magnetron Sputtering

Y. X. Ou,H. Chen,Z. Y. Li,J. Lin,W. Pan,M. K. Lei

DOI: https://doi.org/10.1111/jace.15769

IF: 4.186

2018-01-01

Journal of the American Ceramic Society

Abstract:Development of pulsed-techniques aimed to generate highly ionized target species and high plasma density opens up a new way to tailor composition, structure, and properties of coatings. In this work, TiAlSiN coatings have been deposited at various negative substrate biases (V-s) using deep oscillation magnetron sputtering by sputtering a TiAlSi compound target in Ar/N-2 mixtures. The increase in V-s from -30 to -120V resulted in a decrease in (111)-preferred orientation and grain size, together with the increase in residual stress and rough morphology. The nc-TiAlN/a-Si3N4 nanocomposite structure was obtained in coatings. The highest hardness and Young's modulus reached 42.4 and 495GPa at -120V, respectively. However, at -60V, the coatings with the highest H/E* and H-3/E*(2) ratios of 0.095 and 0.332 exhibited excellent adhesion with above HF1 level, the lowest coefficient of friction (COF) of 0.35 and specific wear rate of 2.1x 10(-7)mm(3)N(-1)m(-1). Wear mechanism changed from the mixture of severe adhesive, oxidative and abrasive wear to mild oxidative wear to severe oxidative wear. TiAlSiN coatings with high hardness and H/E* and H-3/E*(2) ratios exhibited the decrease in COF and wear rate due to refined grains in uniform distribution, which well promoted oxide layers formed on sliding contact surface.
Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region

Roland Thielsch,Alexandre Gatto,Norbert Kaiser

DOI: https://doi.org/10.1364/ao.41.003211

2002-06-01

Abstract:Mechanical stress and the structures of SiO2, Al2O3, and HfO2 single oxide layers and of high-reflection multilayer coatings deposited by reactive evaporation, plasma ion-assisted deposition, and ion-beam sputtering have been studied. The stress was related to the microstructure and to the incorporation of water by means of infrared spectroscopy. From the slopes of measured stress-temperature curves of these coatings deposited onto two substrate materials (silicon and fused silica), the biaxial moduli and the thermal expansion coefficients of the films were estimated.
Microstructure, mechanical properties, and oxidation behavior of arc-evaporated Cr–Al–O–N coatings with various Cr/Al ratios

Zhe R. Liu,Jie Zhang,Xu Sun,Jian W. Du,She Q. Wang,Li Chen

DOI: https://doi.org/10.1016/j.ceramint.2023.02.002

IF: 5.532

2023-04-05

Ceramics International

Abstract:Cr–Al-based oxynitride materials have attracted significant attention as hard protective coatings for decades. However, knowledge of the influence of the constituents on oxidation behavior is limited. Here, Cr–Al–O–N coatings with various Cr/Al ratios prepared using cathodic arc evaporation were studied with respect to their microstructure, mechanical properties, and oxidation behavior. With a decrease in the Cr/Al ratio, the coatings yielded a phase evolution from face-centered cubic CrN to rock salt-type cubic (Cr, Al) 2 O 3 to a wurtzite-type hexagonal AlN structure. The cubic structured coatings showed a comparable indentation hardness, much higher than that of the Cr-free Al–O–N coating with a wurtzite structure. Thermogravimetric together with differential scanning calorimetric (TG-DSC) analysis revealed that the ternary Cr–O–N and Al–O–N coatings were more susceptible to oxidation than the quaternary Cr–Al–O–N coatings. Moreover, isothermal oxidation experiments indicated that the addition of 66 at.% Al within the metallic species gives rise to the growth of an Al-rich oxide scale on top of the Cr–Al–O–N coating. However, this oxide scale containing substantial voids cannot prevent the underlying coating from oxidation. Oxidation kinetics study illustrates that the oxidation activation energies of (Cr x Al 1−x )–O–N coatings with x = 1.00, 0.76, 0.58, 0.33, and 0 are 252.3, 305.2, 370.7, 303.8, and 297.7 kJ/mol, respectively. The best oxidation resistance was obtained by the (Cr 0.58 Al 0.42 )–O–N coating, whereas the Al-containing (Cr 0.33 Al 0.67 )–O–N coating showed inferior oxidation resistance owing to its high intrinsic oxygen fraction.

materials science, ceramics
In-situ real-time evolution of intrinsic stresses and microstructure during growth of cathodic arc deposited (Al,Ti)N coatings

Sanjay Nayak,Tun-Wei Hsu,Lina Rogström,Maiara Moreno,Jon M. Andersson,Mats P. Johansson-Jöesaar,Robert Boyd,Norbert Schell,Jens Gibmeier,Jens Birch,Magnus Odén

DOI: https://doi.org/10.48550/arXiv.2301.03935

2023-01-10

Abstract:The residual stress plays a vital role in determination of the device performance that uses thin films coating and thus the accurate determination of stress and its optimization with process parameters is an ongoing research work for many decades. In line with this, the microscopic origin of the stress at the atomic scale and its development during the thin film deposition is a matter of major scientific interests. The development of stress is a complex phenomenon and has a complex dependence to process parameters, film microstructure and its morphology. In this work, by utilizing a custom-designed cathodic arc deposition system and synchrotron radiation based 2D x-ray diffraction (XRD) technique, we determine the real-time evolution of stress, crystallite sizes and their preferential orientations of Aluminum-Titanium-Nitride (AlxTi1-xN) films with varied Al-content (x=0.0, 0.25, 0.50, and 0.67) on Si-100 substrate. The energies of incoming ions and hence stress in the films is tuned by applying different direct current substrate bias (Vs = floating potential, -20, -40, -60, -80, and -100 V). The instantaneous stress is evaluated by the well-known d vs. sin2{\psi} technique, while crystallite sizes are determined by analyzing line profiles of x-ray diffractograms. The evolution of stress and crystallite sizes are modelled with multiple numerical models from which kinetic parameters associated with the thin film depositions are extracted. The ex-situ microstructure characterizations of AlxTi1-xN coatings are carried out by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The formation of ex-situ microstructure of the films is discussed considering the results obtained from in-situ XRD data. Finally, we demonstrate that the method utilized here is a powerful approach towards estimation of the fracture toughness of thin film coatings.

Materials Science
Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

Fırat Anğay,Lukas Löfler,Florent Tetard,Dominique Eyidi,Philippe Djemia,David Holec,Gregory Abadias

DOI: https://doi.org/10.1116/6.0000292

2020-09-01

Abstract:In this work, the structural and mechanical properties of ternary Mo-Al-N alloys are investigated by combining thin film growth experiments and density functional theory (DFT) calculations. Mo1−xAlxNy thin films (∼300 nm thick), with various Al fractions ranging from x = 0 to 0.5 and nitrogen-to-metal (Al + Mo) ratio ranging from y = 0.78 to 1.38, were deposited by direct-current reactive magnetron cosputtering technique from elemental Mo and Al targets under Ar + N2 plasma discharges. The Al content was varied by changing the respective Mo and Al target powers, at a fixed N2 (20 SCCM) and Ar (25 SCCM) flow rate, and using two different substrate temperatures Ts = 350 and 500 °C. The elemental composition, mass density, crystal structure, residual stress state, and intrinsic (growth) stress were examined by wavelength dispersive x-ray spectroscopy, x-ray reflectivity, x-ray diffraction, including pole figure and <math> si n 2 ψ</math> measurements, and real-time in situ wafer curvature. Nanoindentation tests were carried out to determine film hardness H and elastic modulus EIT, while the shear elastic constant C44 was measured selectively by surface Brillouin light spectroscopy. All deposited Mo1−xAlxNy films have a cubic rock-salt crystal structure and exhibit a fiber-texture with a [001] preferred orientation. The incorporation of Al is accompanied by a rise in nitrogen content from 44 to 58 at. %, resulting in a significant increase (2%) in the lattice parameter when x increases from 0 to 0.27. This trend is opposite to what DFT calculations predict for cubic defect-free stoichiometric Mo1−xAlxN compounds and is attributed to variation in point defect concentration (nitrogen and metal vacancies) when Al substitutes for Mo. Increasing Ts from 350 to 500 °C has a minimal effect on the structural properties and phase composition of the ternary alloys but concurs to an appreciable reduction of the compressive stress from −5 to −4 GPa. A continuous increase and decrease in transverse sound velocity and mass density, respectively, lead to a moderate stiffening of the shear elastic constant from 130 to 144 GPa with increasing Al fraction up to x = 0.50, and a complex and nonmonotonous variation of H and EIT is observed. The maximum hardness of ∼33 GPa is found for the Mo0.81Al0.19N1.13 film, with nitrogen content close to the stoichiometric composition. The experimental findings are explained based on structural and elastic constant values computed from DFT for defect-free and metal- or nitrogen-deficient rock-salt MoAlN compounds.
Structural and Mechanical Properties of Multi-Element (alcrmotatizr)nx Coatings by Reactive Magnetron Sputtering

Keng-Hao Cheng,Chia-Han Lai,Su-Jien Lin,Jien-Wei Yeh

DOI: https://doi.org/10.1016/j.tsf.2010.11.034

IF: 2.1

2010-01-01

Thin Solid Films

Abstract:(AlCrMoTaTiZr)Nx high-entropy films were deposited on silicon wafer and cemented carbide substrates from a single alloy target by reactive RF magnetron sputtering under a mixed atmosphere of Ar and N2. The effect of nitrogen flow ratio RN on chemical composition, morphology, microstructure, and mechanical properties of the (AlCrMoTaTiZr)Nx films was investigated. Nitrogen-free alloy film had an amorphous structure, while nitride films with at least 37at.% N exhibited a simple NaCl-type FCC (face-centered cubic) structure. Mixed structures occurred in films with lower nitrogen contents. Films with the FCC structure were thermally stable without phase decomposition at 1000°C after 10h. The (AlCrMoTaTiZr)N film deposited at RN=40% exhibited the highest hardness of 40.2GPa which attains the superhard grade. The main strengthening mechanisms for this film were grain-size and solid-solution strengthening. A residual compressive stress of 1.04GPa was small to account for the observed hardness. The nitride film was wear resistant, with a wear rate of 2.8×10−6mm3/Nm against a loaded 100Cr6 steel ball in the sliding wear test. These high-entropy films have potential in hard coating applications.
Fabrication, microstructures and optical reflectivity of TiAlN/NiCr composite coating

Xiang Liu,Quanjiang Lv,Haigang Hou,Shahid Hussain,Asma A. Alothman,Saikh Mohammad,Guiwu Liu,Junlin Liu,Guanjun Qiao

DOI: https://doi.org/10.1016/j.optmat.2023.114750

IF: 3.754

2023-12-28

Optical Materials

Abstract:In this work, TiAlN/NiCr composite coatings were prepared by reactive magnetron sputtering technique. Firstly, a single absorber layer was prepared, and at the substrate temperature of 300 °C, a "prismatic" structure is formed on the surface of the TiAlN film, which has good light absorption properties under these conditions. In order to further improve its absorption, the TiAlN/NiCr bilayer coating was designed, and the effects of etching in two different solutions and subsequent annealing treatments on the surface microstructure and reflectivity of the bilayer coating were investigated. These results show that TiAlN/NiCr bilayer coatings fabricated in various etching solutions can further improve light absorption performance, with the TiAlN/NiCr-CAN coating showing particularly good thermal stability and exhibiting further improvements in absorption performance after 500 °C/2 h of annealing. Low-temperature applications are the only ones for which the TiAlN/NiCr–HF coating is suitable, since it fails at the annealing condition of 300 °C/2 h.

materials science, multidisciplinary,optics
Nitride Films Deposited from an Equimolar Al–Cr–Mo–Si–Ti Alloy Target by Reactive Direct Current Magnetron Sputtering

Hui-Wen Chang,Ping-Kang Huang,Andrew Davison,Jien-Wei Yeh,Chun-Huei Tsau,Chih-Chao Yang

DOI: https://doi.org/10.1016/j.tsf.2008.01.019

IF: 2.1

2008-01-01

Thin Solid Films

Abstract:Films are deposited from a single Al(20)Cr(20)Mo(20)Si(21)Ti(19) alloy target in various argon/nitrogen atmospheres by direct current magnetron sputtering. Two sets of substrate parameters are examined; one with a substrate temperature of 300 K and the substrate grounded (U(0) (V,) (300 K)), and the other with the substrate biased at -50 V and its temperature maintained at 573 K (U(-50 V, 573 K)). The films produced in pure argon or at lower nitrogen flow rates are amorphous, regardless of the substrate parameters. At higher nitrogen flow rates, however, all of the coatings are found to form an FCC (face-center-cubic) NaCl-type structure. Although this coating system contains several well known immiscible nitrides, i.e. TiN, AN and Si(3)N(4), it is determined that only a single FCC phase forms, namely a single FCC (AlCrMoSiTi)N solid solution, regardless of the deposition conditions. The lower deposition rate and reduced surface roughness of the U(-50 V, 573 K) films compared to the UO V, 300 K films are considered to result from the increased densification and resputtering of coating material. The majority of the coatings are found to have hardnesses of only 10 to 16 GPa. The highest hardnesses of 25 and 22 GPa are obtained for the crystalline nitride U(-50 V, 573 K) coatings deposited at N(2)/(Ar+N(2)) ratios of 50 and 67%, respectively. More in depth explanations behind the structure and properties of these multi-element films are presented within the paper. (c) 2008 Elsevier B.V. All rights reserved.
On the influence of annealing on the compositional and crystallographic properties of sputtered Li-Al-O thin films

Florian Lourens,Detlef Rogalla,Ellen Suhr,Alfred Ludwig

2024-02-10

Abstract:A Li-Al-O thin film materials library, deposited by inert magnetron sputtering and post-deposition annealing in O2 atmosphere, was used to study the effects of different annealing temperatures (300 to 850°C) and durations (1 min to 7 h) on crystallinity and composition of the films. XPS depth profiling revealed inhomogeneous compositional depth profiles with Li contents increased toward the film surface and Al contents toward the film-substrate interface. These depth profiles were confirmed by a combination of RBS and D-NRA. At annealing temperatures of 550°C and higher, Li reacted with the Si substrate. At the same time, temperatures of 550°C and higher enabled the formation of crystalline LiAlO2, whereas at lower temperatures, no crystalline Li-Al-O phases were detected with XRD. In contrast to conventional annealing in a tube furnace (3 to 7 h durations), rapid thermal annealing with fast heating/cooling rates of 10°C/min and durations of 1 to 10 min resulted in homogeneous depth profiles, while also leading to crystalline LiAlO2.

Materials Science
Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering

Djallel Eddine Touaibia,Sofiane Achache,Abdelhakim Bouissil,Fabrice Parent,Jaafar Ghanbaja,Alina Gorbunova,Pavel S. Postnikov,Mohamed Mehdi Chehimi,Frederic Schuster,Frederic Sanchette,Mohamed El Garah

DOI: https://doi.org/10.3390/ma17122799

IF: 3.4

2024-06-08

Materials

Abstract:This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)Nx/SiNx refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiNx nano-layered architecture. The hardness decreases from 24.3 ± 1.0 GPa to 17.5 ± 1.0 GPa because of the nano-layered architecture, whilst Young's modulus reduces from 188.0 ± 1.0 GPa to roughly 162.4 ± 1.0 GPa. By increasing the thickness of the SiNx nano-layer, kp values decrease significantly from 3.36 × 10−8 g2 cm−4 h−1 to 6.06 × 10−9 g2 cm−4 h−1. The activation energy increases from 90.8 kJ·mol−1 for (AlTiZrHfTa)Nx nitride coating to 126.52 kJ·mol−1 for the (AlTiZrHfTa)Nx/SiNx nano-layered coating. The formation of a FCC (AlTiZrHfTa)-Nx/a-SiNx nano-layered architecture results in the improvement of the resistance to oxidation at high temperature.

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,metallurgy & metallurgical engineering
Effect of Si-addition on structure and thermal stability of Ti-Al-N coatings

Zhe R. Liu,Fei Pei,Li Chen,Paul H. Mayrhofer

DOI: https://doi.org/10.1016/j.jallcom.2022.165483

IF: 6.2

2022-10-05

Journal of Alloys and Compounds

Abstract:The superior mechanical properties and thermal stability of Ti-Al-Si-N coatings have attracted extensive research interests in academia as well as industry. In this study, Ti0.52Al0.48N, Ti0.53Al0.38Si0.09N, Ti0.43Al0.48Si0.09N, and Ti0.48Al0.38Si0.14N coatings are developed by arc-evaporation. This compositional variation allows to study the impact of Al and Si on structure, thermal stability, and oxidation behavior. Incorporation of Si into Ti-Al-N leads to a nanocomposite structure with an amorphous-like SiNx boundary-phase – encapsulating small crystalline Ti-Al-N grains – and promotes wurtzite-type AlN formation. This causes a significant change in the mechanical and thermal properties of the originally single-phase face-centered cubic structured Ti0.52Al0.48N. The Si-containing coatings experience an initial increase in hardness from 29.1 ± 1.0 GPa for Ti0.52Al0.48N to 33.1 ± 1.2 GPa for Ti0.53Al0.38Si0.09N, and then a decrease to 26.4 ± 0.8 GPa for Ti0.43Al0.48Si0.09N and 28.1 ± 0.8 GPa for Ti0.48Al0.38Si0.14N. Alloying with Si improves the thermal stability of Ti-Al-N by retarding the decomposition towards its thermodynamically stable constituents TiN and AlN. Moreover, the oxidation resistance of Ti-Al-N can be largely improved by the Si-addition due to the retarded anatase-to-rutile TiO2 transformation as well as the formation of a protective oxide scale at the nitride-to-oxide interface. Cross-sectional scanning electron microscopy studies reveal that the oxide scales of the Si-containing coatings exhibit a lamellar structure comprising Al-rich, TiSi-rich, and/or Ti-rich oxide layers. Higher Si and, especially, higher Al content is favorable to the formation of an Al-rich layer, which can act as a diffusion barrier for oxygen. Especially, all Si-containing coatings present an abnormal oxidation behavior, where the consumed nitride layer thickness is not continuously increasing with oxidation temperature.

materials science, multidisciplinary,chemistry, physical,metallurgy & metallurgical engineering
Structure, electrical, and optical properties of reactively sputter-deposited Ta—Al—N thin films

Fırat Anğay,Sophie Camelio,Dominique Eyidi,Bärbel Krause,Gregory Abadias

DOI: https://doi.org/10.1063/5.0082537

IF: 2.877

2022-03-14

Journal of Applied Physics

Abstract:We report on the influence of Al content on the structural, electrical, and optical properties of polycrystalline ternary Ta—Al—N thin films. Ta 1−x Al x N y thin films with x up to 0.69 and 0.92 ≤ y ≤ 1.22 were deposited on silicon substrates by means of direct current reactive magnetron co-sputtering from elemental Ta and Al targets. The elemental composition, crystal structure, bonding state, and electrical and optical properties of the deposited films were characterized using wavelength-dispersive x-ray spectrometry, x-ray diffraction, x-ray photoelectron spectroscopy, four-point probe electrical resistance, and spectroscopic ellipsometry (SE), respectively. The real part (ɛ 1 ) and imaginary part (ɛ 2 ) of the dielectric constants were derived from the SE data, which were simulated and fitted by using a Drude and Lorentz oscillator models. The Ta 1−x Al x N y films are characterized by a compact microstructure, which becomes more columnar with increasing Al content. It is found that the incorporation of Al into TaN lattice results in the stabilization of cubic Ta 1−x Al x N y solid solutions up to x = 0.40, while a hexagonal phase is formed for 0.48 ≤ x ≤ 0.69. This structural transition is accompanied by a change in the chemical bonding state, high electrical resistivity (8–10 mΩ cm), and semi-transparent character. Ternary Ta 1−x Al x N y alloys with a small amount of Al (x = 0.02 and 0.06) show superior electrical and optical conductivities compared to a binary TaN compound, making them appealing material candidates for UV plasmonic applications.

physics, applied

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Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering

Effect of Si-addition on structure and thermal stability of Ti-Al-N coatings

Structure, electrical, and optical properties of reactively sputter-deposited Ta—Al—N thin films