Diffractive Optical Elements Arrays with Continuous Deep-relief for Maskless Lithography

单明广,郭黎利,钟志
IF: 0.6
2009-01-01
ACTA PHOTONICA SINICA
Abstract:Diffractive optical elements (DOEs) arrays with continuous deep-relief for maskless lithography is investigated.In comparison with such conventional DOEs arrays as zone-plates array used for maskless lithography,the DOEs with continuous deep-relief make it possible to further increase NA at a high diffraction focusing efficiency,and deep relief can be used to optimize relief depth and zone period to make the fabrication of arrays easy.To verify its validity,continuous-deep-relief DOEs arrays with F/7.5 are designed,fabricated and characterized for maskless lithography.Experimental results indicate that a diffraction efficiency of over 70% can be achieved at normal incidence and writing laser wavelength of 441.6 nm,which is much higher than the diffraction efficiency of 40% for a zone-plates array.
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