A Complete and Automatic Advanced Model Verification Platform for 32nm Technology and Beyond

Yanfeng Li,Riko Radojcic,Mark Nakamoto,Juzer Fatehi,Geng Zhang,Xisheng Zhang,J. F. Kang
DOI: https://doi.org/10.1109/irps.2009.5173258
2009-01-01
Abstract:Variability from different sources such as layout-dependent effect has been a main obstacle against aggressive design rule and shrinking corner margins in 45 nm node and beyond. This paper reports and demonstrates a verification platform to qualify the advanced models that address variability including layout-dependent reliability effects. This verification platform has been successfully used in real design exercise at 45 nm technology and is being applied for 32 nm technology. Test structures and methodologies of verifying different variability-aware models are presented. The platform was demonstrated to be flexible enough to account for new layout-dependent reliability behaviors in STRAIN technology.
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