Effects of fluorine ions implantation on high-temperature oxidation resistance of TiAlNb alloy

Guang-ze TANG,Ke-wen SUN
DOI: https://doi.org/10.13251/j.issn.0254-6051.2009.07.021
2009-01-01
Abstract:TiAlNb alloy surface was fluorated by plasma based ion implantation and the high-temperature oxidation kinetics behavior of samples with various implantation dose were studied at 800℃ and 900℃.The results show that the high-temperature oxidation resistance of TiAlNb alloy can be improved significantly by fluorine ions implantation.The phase composition and microstructure from XRD and SEM show that a compact Al2O3 block layer is generated on TiAlNb alloy with fluorine implantation during high-temperature oxidation.This compact Al2O3 layer inhibits the diffusion of oxygen to the substrate.Therefore,the high-temperature oxidation resistance of TiAlNb alloy is improved.
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