The effect of buffer layer on resistivity of Au thin films

Wu Tang,Xuesong Yin,Longjiang Deng

2009-01-01

Abstract:Au films were deposited on the Al2O3 and NiCr/Ta coated Al2O3 substrates by rf-magnetron sputtering. The sheet resistance for as-deposited and annealed samples was analyzed by four point probe measurement. The resistivity for as-deposited Au films on Al2O3 decreased with increasing deposition temperature, however, would become stable above 180°C. The resistivity of all those Au films on Al2O3 decreased and reached a minimum of 2.6μΩ·cm after annealing. Moreover, the resistivity of Au films on NiCr/Ta coated Al2O3 was higher than their counterparts on Al2O3 at the same deposition temperatures. Besides, abnormal increasing resistivity was found for the samples on NiCr/Ta coated Al2O3 after 1h annealing at 300, 400 and 500°C, respectively.