An in Situ Method for Characterizing the Kinetics of the Oxidation Process of Copper Thin Films Via Sheet Resistance

Luo Yu-Feng,Zhong Cheng,Zhang Li,Yan Xue-Jian,Li Jin,Jiang Yi-Ming
DOI: https://doi.org/10.7498/aps.56.6722
IF: 0.906
2007-01-01
Acta Physica Sinica
Abstract:In this paper, a new in situ method was developed for characterizing the kinetics of the oxidation process of copper thin films by using sheet resistance. Copper thin films were prepared on glass substrate by vacuum deposition. The oxidation kinetics of the copper thin films was studied via sheet resistance which increased during the process. The results suggested that this new method can be applied to the characterization of the reaction kinetics of copper thin film.
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