Effect of non- uniform demagnetizing field on the anisotropic magnetoresistance of NiFe element

Hui ZHANG,Jiao TENG,Guang-Hua YU,Xing-Fang WU,Feng-Wu ZHU
DOI: https://doi.org/10.3969/j.issn.1007-4252.2007.05.008
2007-01-01
Abstract:NiFe thin films were prepared with magnetron sputtering. By using optical lithography and ion etching, NiFe films were patterned into AMR element with width of 20 μm, thickness of 20 nm, and length of 2.5 mm. The Anisotropic magnetoresistance of NiFe element were measured. Taking into account the non-uniformity of demagnetizing field along the width of AMR element, Magnetoresistance ratio have been numerically calculated. The results have shown that theoretical results are in good agreement with experiment.
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