Fabrication of nanorods in cluster by ammoniating technique and the function of Mg

Yu-jie AI,Cheng-shan XUE,Li-li SUN,Chuan-wei SUN,Hui-zhao ZHUANG,Fu-xue WANG,Zhao-zhu YANG,Li-xia QIN
DOI: https://doi.org/10.3321/j.issn:1001-9731.2007.02.008
2007-01-01
Abstract:GaN thin films were successfully prepared on the Si (111) substrates through ammoniating Ga 2O 3/Mg thin films deposited by magnetron sputtering. The results of XRD, XPS, SAED and HRTEM confirm that the as-grown films are single-crystal hexagonal GaN with wurtzite structure. We observed the morphology of GaN nanorods with the diameter ranging from 200 to 600 nm by SEM. We discussed the function of the Mg middle layer briefly.
What problem does this paper attempt to address?