Binary photon sieve

Changlun Hou,Jianfeng Xu,Jian Bai,Guoguang Yang
DOI: https://doi.org/10.3969/j.issn.1007-2276.2011.03.021
2011-01-01
Abstract:Based on photon sieve and binary optics element, a novel diffractive element was developed which was called binary photon sieve. Compared with conventional photon sieve which was consist of millions of holes distributing on the corresponding transparent circular rings of the Fresnel zone-plates, binary photon sieve had a higher transmission and diffractive efficiency. The binary photon sieve was consist of millions of holes on both the corresponding transparent and opaque circular ring of Fresnel zone-plates, while there was a π phase shift between this two kinds of holes. The theoretical model of binary photon sieve was established and the binary photon sieve design method was depicted. According to the design method of binary photon sieve, a F10 binary photon sieve was designed for working at 650 nm wavelength. By lithography and reaction ion beam etching (RIBE) technology, a binary photon sieve was fabricated. And also the diffraction efficiency, transmission wavefront of the fabricated binary photon sieve was tested.
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