Preparation Of La-Doped Bifeo3 Thin Films With Fe2+ Ions On Si Substrates

Feng Gao,Cong Cai,Yijun Wang,Shuai Dong,Xiaoyan Qiu,Guoliang Yuan,Zhiguo Liu,Junming Liu
DOI: https://doi.org/10.1063/1.2195368
IF: 2.877
2006-01-01
Journal of Applied Physics
Abstract:La-doped BiFeO3 thin films with Fe2+ ions have been prepared on Pt/TiO2/SiO2/Si substrates by pulsed laser deposition in order to enhance the ferroelectric and magnetic properties. The targets for the film deposition were synthesized using a rapid liquid phase sintering technique to ensure the low leakage. The dielectric properties at room temperature and above were investigated. It was observed that the La doping greatly enhances the ferroelectric polarization at room temperature by modifying the film structure from rhombohedral to monoclinic. The saturation magnetization was enhanced about two times due to the Fe2+ ions in the thin films. (C) 2006 American Institute of Physics.
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