Fabrication of AFM Probe Tip Based on Self-sharpening Effect

LIU Fang,ZHAO Gang,WU Ya-lei,CHU Jia-ru

2006-01-01

Abstract:A fabrication process of AFM tip was designed by the tip self-sharpening model and the crystal plane intersection model,and the tip was prepared by the fabrication process.By the experimental results and the crystal plane intersection model.The relationship of the shape of the tip with the concentration of the etchant,the temperature of the etchant,the additive in the etchant and the mask direction were obtained.Simultaneously,the self-sharpening conditions of the tip on(100) silicon wafers were obtained by the self-sharpening model.Finally,the processing parameters are optimized,and the single crystalline silicon tip with an aspect ratio of 1.56 and a good surface smoothness is achieved in 15 mol/L KOH solution at 70 ℃ when the edges of the square mask is parallel with 110 direction,which its formation satisfies with the self-sharpening conditions and has a high repeatability.