Abstract:The evolution of surface morphologies of films prepared by ion-based deposition techniques has been investigated by atomic force microscopy. Two deposition processes, filtered arc deposition (FAD) and ion-beam-assisted deposition, where low-energy (<100 eV) ion irradiation and high-energy (several tens of keV) ion-beam bombardment concurrent with film growth were involved, respectively, have been employed to prepare TiN and Al films. Comparative studies on the effect of energetic ions on the development of topography have been performed between the low-ion-energy regime and high-ion-energy regime. In addition, the relationship between topography and mechanical properties of thin films has been revealed, by involving thin films prepared by thermal evaporation deposition (TED), where almost all depositing particles are neutral. In the images of the TED TiN and Al films, a large number of porous and deep boundaries between columnar grains was observed, suggesting a very rough and loose surface. In contrast, the FAD films exhibited much denser surface morphologies, although still columnar. The root-mean-square roughness of the FAD films was less than 1 Å. Hardness test and optical parameter measurement indicated that the FAD films were much harder and, in the case of optical films, much more transparent than the TED films, which was considered to arise from the denser surface morphologies rather than crystallization of the films. The high density and super smoothness of the FAD films, and the resultant mechanical and optical properties superior to those of the TED films, were attributed to the enhancement of surface migration of the deposited adatoms in the FAD process, which could provide intensive low-energy ion irradiation during film growth. As for topography modification by high-energy ion-beam bombardment concurrent with film growth, in addition to the increase of surface diffusion due to elastic collision and thermal spikes, physical sputtering must be considered while explaining the development of the film topography. Both surface migration enhancement and sputtering played important roles in the case of high-energy heavy-ion-beam bombardment, under which condition surface morphology characterized by dense columns with larger dimension and deep clean boundaries was formed. However, under high-energy light-ion-beam bombardment, the sputtering was dominant, and the variation of sputtering coefficient with position on the surface of growing film led to the formation of cones.

Study of intense pulsed ion beam mixing with RBS

Study on intense pulsed ion beam mixing of Ni/Ti and Al/Ti systems

Study of metal film/substrate mixing by intense pulsed ion beam

Intense Pulsed Ion Beam Mixing of Al , Ti , Ni , Cu Film / Substrate Systems 1

Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering

A Calculation on the Metal - Film Mixing by Intense Pulse Ion Beam (IPIB)

Influences of the Irradiation of Intense Pulsed Ion Beam (IPIB) on the Surface of Ni₃Al Base Alloy IC6

Surface Modification of Ni3al-Based Alloy Ic6 with Intense Pulsed Ion Beams

Investigation of Intermixing and Phase Change of Ni/SiO_2 under Swift Heavy Ion Irradiation

Study of ion sputtering on AlxSn100-x alloy system

Irradiation effects of intense pulsed ion beam on the surface of NiAl alloy

A Simulation Study of Interface Mixing During Ion-Assisted Deposition

Effect Of Irradiation With Intense Pulsed Ion Beams On The Phase Evolution Of Ni3al Based Superalloy Ic6

Microstructure Formation and Mechanical Properties of Metastable Titanium-Based Gradient Coating Fabricated via Intense Pulse Ion Beam Melt Mixing

Atomic Force Microscopy Study on Topography of Films Produced by Ion-Based Techniques

A Study on Microstructure and Service Property of Ni3Al Base Alloy Irradiated by Intense Pulsed Ion Beams

Irradiation Effects on the Interfacial Adhesion Between Ti Films and SiO2 Substrate

Tribological Properties of Ti-Al-N Films Prepared by Plasma-Based Ion Implantation Mixing

Numerical Study on Interaction of High Intense Pulsed Ion Beam and Ti Target

Hydrodynamic Effects on the Surface Morphology Evolution of Aluminum Alloy under Intense Pulsed Ion Beam Irradiation

Novel microstructures on the surfaces of single crystal silicon irradiated by intense pulsed ion beams