Intense Pulsed Ion Beam Mixing of Al , Ti , Ni , Cu Film / Substrate Systems 1

S. Yan,X. Y. Le,W. J. Zhao,Y. J. Shang,Wang Yugang,Xue Jianming
2006-01-01
Abstract:311 Abstract – Intense pulsed ion beam (IPIB) benefits mixing more than traditional ion beam does because of its high power density and high energy deposition density. It may us eful for forming surface with excellent serving properties. In this work, the IPIB mixing effect of different film/substrate combinations, Al/Ti, Ti/Al, Ni/Al, Ni/Ti and Ni/Cu were studied. It was found that the mixing effect and the film ma terial depth distribution are independent of the solubility of two materials of film and substrate, but obviously inversed relate to the difference on some thermodynamic parameters of them. Mass loss of film material was serious during IPIB irradiation. However, the thickness of mixing layers of all combinations are over 1 μm, although in some case only a small amount of film materials were retained. The IPIB mi xing mechanisms and the reason of mass loss of film materi als are discussed.
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