Study of Intense Pulsed Energy Effects for High Power Pulsed Ionbeam Implantation

Zhao Weijiang,YAN Sha,LE Xiaoyun,HAN Baoxi,XUE Jianming,WANG Yugang,Remnev G E,Opekounov M S,Isakov I F,I
DOI: https://doi.org/10.3321/j.issn:0253-3219.2000.10.004
2000-01-01
Nuclear Techniques
Abstract:In this paper the intense pulsed energy effects of high power pulsed ion beams (HPIBs) are proved to be very important and useful in ion beam implantation. Three groups of 45# steel samples were implanted with the pulsed ion beams of Cn+ + H+ at the acceleration voltage of 150-260kV for the pulse duration of 50-150ns with the current density of 15-120A/cm2, while a low ion dose of about 1 ×1014cm-2 was kept for all implanted samples. Then their tribological properties as well as microhardness were measured, and their morphology and structure information were given by using SEM and X-ray diffraction analysis. The results showed that the materials' surface properties and microstyucture have been modified due to the HPIB implantation even at such low level of ion dose, and the modifications strongly depended on the pulsed power density and pulsed energy density of HPIBs. These phenomena were considered as the intense pulsed energy effects and discussed on the basis of one dimensional heat conduction model. Meanwhile, the hardly changed surface microhardness and friction coefficient of 45# steel samples implanted with traditional (C++H+) ions at an ion dose of 1 ×1014cm-2 was given for a demonstration, in which the intense pulsed energy effects are relatively independent of the ion doping effects.
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