Temperature Uniformity of the Laser Exposed Area

WANG Hua-ming,YE Yu-tang,WU Yun-feng,LIU Lin,FANG Liang,LIU Xue-zhi

DOI: https://doi.org/10.3969/j.issn.1003-501x.2006.04.013

2006-01-01

Abstract:A temperature uniformity method for the laser exposed area is presented. This method makes the best of the advantage of binary optics and liquid crystal-spatial light modulator. It can avoid the unhandy of binary optics and the low efficiency of liquid crystal-spatial light modulator according to the demand. It optimizes temperature uniformity system. For researching the feasibility of this method, a binary optics with 16 gray levels has been designed by using Genetic algorithm. Considering the binary optics can only work in special condition, another method using Liquid Crystal-Spatial Light Modulator is presented. It’s a real-time and controllable method and it can ream-time control the temperature distribution of the exposed area. Theoretical analysis and simulation results indicate that if the proper method is selected according to practical demands, temperature uniformity of the exposed area can be realized effectively.