Temperature Uniformity Control in MOCVD Based on Modeling and Optimization

XU Li,LU Er-feng,ZHOU Feng
DOI: https://doi.org/10.16553/j.cnki.issn1000-985x.2013.06.034
2013-01-01
Abstract:A modeling and optimization based control scheme is proposed to improve the wafer temperature uniformity in MOCVD reactor chamber.A neural network based temperature model is established by modeling the relation between the heating power and the corresponding wafer temperature.Taking the temperature uniformity as the performance index,the heating power ratio is optimized by employing the bionic optimization algorithm and the obtained temperature model.The temperature uniformity control is thus performed in real time by constantly modifying the heating power ratio.Experiments results are presented to show the effectiveness of the proposed scheme.
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