Abstract:Recently, there has been an increasing interest in ZnO due to its electrical, optical and piezoele-ctric properties making suitable for many applications such as light emitting diodes, photodetectors, surface acoustic waves device and so on. SAW filters with working frequency higher than 1 GHz will be widely applied in the intending wireless communication, whereas higher resonant frequencies (superior to 2.5 GHz) tend to push the limits of conventional photolithography. ZnO/diamond structure as SAW substrates offers an attractive means for relaxation of the lithographic criteria since ZnO has excellent piezoelectricity while diamond has the highest elastic and stiff coefficient and highest sound velocity. The use of ZnO based on diamond as SAW substrates offers an attractive means for relaxation of the lithographic criteria since diamond has the highest stiff coefficient and sound velocity. SAW devices have been reported based on ZnO/diamond/Si layered structures with a diamond layer of 10~100 μm deposited by chemical vapor deposition (CVD) technique. However the silicon substrate restricts the heat dissipation performance of the diamond films. In regard of actual applications, a ZnO/diamond layered structure without a silicon substrate can make full use of the outstanding thermal, elastic, and sound velocity characteristics of diamond while avoiding restriction of heat dispassion due to additional silicon substrates. High quality ZnO films are currently the foundation of device preparation and the variation of deposition technological parameters is an important factor to obtain ZnO films with high quality.In this paper, ZnO thin films have been prepared on the smooth nucleation surfaces of freestanding CVD thick diamond films by reactive radio-frequency magnetron sputtering. With the variation of O2/Ar, the growth and optical properties of the ZnO films are characterized experimentally by X-ray diffraction, room temperature photoluminescence spectra, and electron probe microanalysis and Hall measurements. The results indicate that the ZnO film deposited with a O2/Ar ratio of 1 is of c-preferred orientation and high resistivity and has the best optical property.

Deposition of ZnO Films on Thick Diamond Films

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Deposition of Zno Films on Freestanding Cvd Thick Diamond Films

Preparation and optimization of ZnO films on single-crystal diamond substrate by metal-organic chemical vapour deposition

The Growth and Optical Properties of ZnO Films Deposited on Freestanding Thick Diamond Films

Advances in Research on Deposition Techniques for ZnO Thin Films

Growth and Properties of ZnO Film on CVD Diamond Film by Pulsed Laser Deposition

Growth of Cubic MgxZn1-xO Films and Characterization

Two-Step Growth of Zno Thin Films on Diamond/Si by Low-Pressure Metal-Organic Chemical Vapour Deposition

Zno Thin Film Grown by Metal-Organic Chemical Vapor Deposition

Influences of Substrate Temperature on the Crystalline Characteristics and Optical Properties for ZnO Films Deposited on Freestanding Thick Diamond Films

Mocvd Growth and Properties of Zno Films Using Dimethylzinc and Oxygen

B23-O-15 Van Der Waals Epitaxial Growth of Highly-textured ZnO Thin Film on Surface-modified Silicon Substrates by Chemical Bath Deposition

Comparative Study of Diethylzinc and Dimethylzinc for the Growth of Zno

Zn and ZnO films deposited by ionized cluster beam and reaction ionized cluster beam techniques

Diamond Film Deposited on A Silica Substrate with A Znoal Intermediate Layer by Hot-Filament Chemical-Vapor-Deposition

Characteristics of Zno Film Grown by Mocvd

Effect of ZnCl2 assisted chemical bath deposition on preferred orientations and optical properties of ZnO films

Preferential growth of ZnO thin films by the atomic layer deposition technique

Structural, Morphology and Optical Properties of Epitaxial Zno Films Grown on Al2o3 by Mocvd

Ordered ultra thin ZnO films on metal substrate