Dielectric Properties of Multilayered Ba0.5sr0.5tio3 Thin Films Deposited on Ito-Coated Corning 1737 Glass by Rf Magnetron Sputtering

MT Lin,GR Chen,YX Yang,T Xiao,Y Xu,JH Lou,CX Chen
DOI: https://doi.org/10.1088/0256-307x/22/11/061
2005-01-01
Chinese Physics Letters
Abstract:A new stacking method via variation of substrate temperature in rf magnetron sputter is used to fabricate polycrystalline/polycrystalline Ba0.5Sr0.5TiO3 thin films with higher dielectric constant, higher breakdown strength and lower leakage current densities than those prepared by a conventional deposition method. The improved figure of merit G (e0erEb) of the Ba0.5Sr0.5TiO3 thin films implies that they are a feasible insulation layer for thin film electroluminescent devices.
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