Molecular Beam Epitaxy Growth Of Cdte On Si(211)

Liang Chen,Yuanzhang Wang,Yan Wu.,Jun Wu,Meifang Yu,Yimin Qiao,Li He
DOI: https://doi.org/10.1117/12.573170
2005-01-01
Abstract:CdTe growth on Si is the major challenge for HgCdTe. The recent results on MBE growth of 3-in CdTe(211)B/Si are reported. The Si substrates were (211) orientated, and a low temperature surface cleaning process was employed. To obtain twin-free CdTe(211)B, nucleation process of ZnTe on Si was studied at different conditions. Under the optimal growth condition, the average FWHM value less than 120 arc sec of twin-free CdTe(211)B films for 10-12 mu m was obtained. The lowest FWHM value of 100 arc sec was achieved.
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