Fabrication and Characterization of MgxNi1-xO Thin Films by Sol-Gel Dip-Coating

Zuopeng He,Zhenguo Ji,Juan Du,Wei Wang,Jia FAN,Zhizhen YE
DOI: https://doi.org/10.3969/j.issn.1674-4926.2005.04.017
2005-01-01
Abstract:To research a novel solar-blind material, MgxNi1-xO thin film with absorption edges in the solar-blind region (240-280 nm) is successfully prepared on quartz substrates by sol-gel method followed by post annealing at different temperatures. The films are characterized by XPS, XRD and UV-vis spectra measurements. The results show that MgxNi1-xO (x=0-0.3) films with cubic NiO structure are formed at 1000°C and the absorption edges of the films varied as the amount of Mg changed. The MgxNi1-xO films with x=0.2-0.3 show absorption edges in the range of 248 nm to 276 nm, which is in the solar-blind region. The photoresponse results show that for Mg0.3Ni0.7O thin film it is not sensitive to the sunlight, but is very sensitive to the 254 nm ultraviolet radiation, with change in resistance up to 40%.
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