Wet Oxidation of AlxGa1-xAs/GaAs Distributed Bragg Reflectors

李若园,王占国,徐波,金鹏,张春玲,郭霞,陈敏

DOI: https://doi.org/10.3321/j.issn:0253-4177.2005.08.008

2005-01-01

Abstract:The wet oxidation of AlGaAs with high Al content in a distributed Bragg reflectors (DBR) is studied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Some voids distribute along the oxide/GaAs interfaces due to the stress induced by the wet oxidation of the AlGaAs layers. These voids decrease the shrinkage of the Al2 O3 layers to 8 % instead of the theoretical 20 % when compared to the unoxidized AlGaAs layers. With the extension of oxidation time,the reactants are more completely transported to the front interface and the products are more completely transported out along the porous interfaces. As a result,the oxide quality is better.