High-Reflectivity Algan/Aln Distributed Bragg Reflector In Ultraviolet Region

Ji Xiao-Li,Jiang Ruo-Lian,Xie Zi-Li,Bin Liu,Zhou Jian-Jun,Liang Li,Ping Han,Rong Zhang,Zheng You-Dou,Gong Hai-Mei
DOI: https://doi.org/10.1088/0256-307X/24/6/083
2007-01-01
Chinese Physics Letters
Abstract:Thirty-pair Al(0.)3Ga(0.7)N/AlN distributed Bragg reflectors centred at 320 nm are designed and grown on sapphire substrates by metalorganic chemical vapour deposition. No cracks are observed in the main area of the 2-inch wafer except for about 4 mm margin under an optical microscope. Regular stack of alternating layers is shown by scanning electron microscopy. Clear two-dimensional growth steps and very low surface roughness are shown by atomic force microscopy (AFM). Well-defined periodicity is shown by high resolution x-ray diffraction. High reflectivity of 93% at 313 nm with a bandwidth of 13 nm is obtained.
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