Abstract:We report the optical characterization of bi-layer and quadri-layers of TiO 2 /ZnO transparent oxide films having a net thickness of 100 nm. The atomic layer deposition (ALD) was used to grow these multiple-layered films. We examined their optical properties to understand the impact of the number of layers. The grazing incidence X-ray diffraction (GIXRD) was used to assess the microstructure of the films, which showed that the ZnO layers were polycrystalline, while the TiO 2 layers were (X-ray) amorphous. The optical transmission and reflection spectra of the investigated films were recorded in the range of 150–2500 nm at room temperature. The refractive index (n), extinction coefficient (k), real and imaginary parts of the dielectric constant, optical conductivity, and loss factor agree well with those of other amorphous oxides. It was established that the indirect allowed optical transitions are favorable and the optical gap ( E g ) increases from 3.03 eV to 3.14 eV as the number of layers increases. The contribution of polarizability (ξ) and electrical susceptibility (χ e ) to the dielectric constant was also discussed. The relation between the relative density ( D ) and the porosity ( P ro ) with the crystalline quality, layer thickness, and the number of layers was also estimated The results obtained from the study of TiO 2 /ZnO multilayer films indicate that multilayer thin films improve the quality of film crystallinity and optical properties with the increase of the layers numbers, and could guide the development of potential applications.

Study of Optical and Electrical Properties of TiO2/Ag/TiO2 Multilayers

Microstructure and Optical Properties of Ag/Tio2 Multilayers

Fabrication and Properties of Transparent Conductive AZO/Cu Bilayer Films

Effect of Ag layer thickness on optical and electrical properties of ion-beam-sputtered TiO2/Ag/TiO2 multilayer thin film

Investigation of optical and electrical properties of TiO2, SiO2, and Ag single and multilayer thin films using spectroscopic ellipsometry and spectrophotometry methods: prepared by spin coating and DC magnetron sputtering

Design, preparation, and property analysis of metal/dielectric multilayer film with wavelength selectivity

Influence of Ag interlayer Thickness on the Optical, Electrical and Mechanical Properties of Ti-doped In2O3/Ag/Ti-doped In2O3 Multilayer Flexible Transparent Conductive Electrode

Growth of Low-Emissivity Films by RF Magnetron Reactive Sputtering

Structural and Optical Properties of Macroporous Ag@TiO 2 Thin Films Prepared by a Facile One-Step Sol–gel Method

Microstructure Studies of TiO2-Ag-TiO2-SiO Low-Emissivity Films at Nanometer Scale

Influence of Interface Layer on Optical Properties of Sub-20 Nm-Thick TiO2 Films

Study of composite TiN/Ag/Cu2O/TiO2 with improved photocatalytic performance

Research of Optical and Structural Properties in Cu/Ti Multilayer Films

SiO2–TiO2 multilayer via electrochemical deposition: characterization of reflection and refractive index

Influence of multi-interfacial structure on mechanical and tribological properties of TiSiN/Ag multilayer coatings

Ar Plasma Irradiation Improved Optical and Electrical Properties of Tio2/Ag/Tio2 Multilayer Thin Film

Synthesis of multiple layers of alternating ZnO and TiO 2 using atomic layer deposition and their optical characterization

Optimization of the thickness of glass/TiO2/Ag/Ti/TiO2/SiON multilayer film

Studies on the Physical Properties of TiO2:Nb/Ag/TiO2:Nb and NiO/Ag/NiO Three-Layer Structures on Glass and Plastic Substrates as Transparent Conductive Electrodes for Solar Cells

STRUCTURE AND OPTICAL PROPERTIES OF HIGH-RATE LOW-TEMPERATURE GROWN TiO2 THIN FILMS BY REACTIVE MAGNETRON SPUTTERING

THE OPTICAL AND ELECTRICAL PROPERTIES OF ZnO/Ag/ZnO FILMS ON FLEXIBLE SUBSTRATE