Abstract:TiO2-doped HfO2 gate dielectric thin films have been deposited on Si(100) substrates by RF sputtering. The component, morphology, structure, optical and interfacial properties of Hf-1 xTixO2 films related to TiO2 concentration are systematically investigated by atomic force microscope (AFM), X-ray diffraction (XRD), spectroscopic ellipsometry (SE), X-ray photoelectron spectroscopy (XPS), and Fourier transformation infrared (FTIR). By employing Cauchy-Urbach model, the optical constants, such as refractive index (n), extinction coefficient (k), absorption coefficient (alpha), and optical band gap (E-g) have been determined precisely. Measurements from XRD have confirmed that TiO2 incorporating into HfO2 films leads to the increase of the crystallization temperature of HfO2 films with increasing the TiO2 concentration. SE analyses have indicated that reduction in band gap and refractive index has been observed with increasing the TiO2 component in Hf-1 xTixO2 films. The increase in Urbach parameter E-U with the increase of TiO2 concentration also suggests the rise in disorder for Hf-1 xTixO2 films. FTIR measurements for Hf-1 xTixO2/Si gate stack indicate the existence of the interfacial layer regardless of the TiO2 concentration. For the 9% TiO2-doped HfO2 samples, the shift in FTIR characteristic peak suggests the formation of the silicate layer, which leads to the suppressed interfacial layer growth during deposition. As a result, it can be conclude that the TiO2 component in Hf-1 xTixO2 films should be controlled precisely to guarantee interfacial properties of Hf-1 xTixO2/Si gate stacks. (C) 2014 Elsevier B.V. All rights reserved.

Microstructure Studies of TiO2-Ag-TiO2-SiO Low-Emissivity Films at Nanometer Scale

Microstructure and Optical Properties of Ag/Tio2 Multilayers

Controllable Hydrothermal Synthesis, Optical and Photocatalytic Properties of TiO2 Nanostructures

Low-Temperature Preparation of Ag-TiO2 Composite Films and Their Properties

Microstructure Optimization and Optical and Interfacial Properties Modulation of Sputtering-Derived Hfo2 Thin Films by Tio2 Incorporation

Growth of Low-Emissivity Films by RF Magnetron Reactive Sputtering

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Effects of Heat-Treatment Temperature on Preparation of the Sol-Gel-Derived Ag/TiO2 Films

Study of Optical and Electrical Properties of TiO2/Ag/TiO2 Multilayers

Surface Characterization of Thin Titania Films Prepared at Low Temperatures

Investigation on the Microstructure and Optical Performance of TiO_2 Films by Sol-Gel Method

Sol-Gel Preparation and Optical Properties of Ag Nanoparticle/TiO2 Composite Films

Study on microstructure of Ag-SiO2 nanometer composite thin films

Study of Self-Cleaning and Low-Emission Properties of FTO/TiO2 Composite films

Optical and microstructural properties of ZnO/TiO 2 nanolaminates prepared by atomic layer deposition

Micro-/nano-scale structure and elemental diffusion in the Al/Ti/Al sandwich structure

TEM and TEM-EDX Analysis of Cross-Section of Anti-Reflective Thin Film and Glass Substrate

Study of the Crystal Structure, Band Gap and Dispersion Evolution in Titanium Oxide Thin Films

Microstrcture Characterization and Properties of TiO2/α-FeOOH Nanocomposites

Influence of Interface Layer on Optical Properties of Sub-20 Nm-Thick TiO2 Films

Influence of preparation technique on the microscopic structure and surface morphology of nanometer TiO2 thin films