CVD Al2O3-SiO2 compound and the mechanism investigation

Zhaofeng Chen,Litong Zhang,Laifei Cheng,Yongdong Xu,Zhihao Jin
2004-01-01
Rare Metal Materials and Engineering
Abstract:The composition and microstructures of the Al2O3-SiO2 system coatings fabricated by chemical vapor deposition using AlCl3-SiCl4-H-2-CO2 were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al2O3 attached amorphous SiO2. The size of the Al2O3-SiO2 particles declined with CVD temperature increasing in the range of 550degreesC to 850degreesC. Dense and crystalline 3Al(2)O(3)(.)SiO(2)-alpha-Al2O3-iota-Al2O3-SiO2 coating was obtained by CVD at 1050degreesC.
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