Hetero-Epitaxy ZnO/SiC/Si by LP-MOCVD

朱俊杰,林碧霞,姚然,赵国亮,傅竹西
DOI: https://doi.org/10.3321/j.issn:0253-4177.2004.12.022
2004-01-01
Abstract:High qualitical ZnO thin films are deposited on Si(111) substrates by double connected low pressure metal-organic chemical vapor deposition (LP-MOCVD), with SiC buffer layer used. The effect of SiC buffer layer on the structure and luminescence properties has been investigated with X-ray diffraction (XRD) and photoluminescence (PL) spectra at room temperature. The full-width at half maximum (FWHM) of rocking curve of ZnO(002) reflection is reduced with SiC buffer layer used. The intensity of luminescence of ZnO films is also increased. In addition, with the SiC buffer layer, green luminescence is appeared which is considered to be from the electron transition from conduction band bottom to the OZn level formed in the band gap.
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