Piezoresistance Characteristics of Ytterbium Thin Film Grown by Magnetron Sputtering

滕林,杨邦朝,杜晓松,周鸿仁
DOI: https://doi.org/10.3969/j.issn.1672-7126.2004.06.020
2004-01-01
Abstract:The structures and morphology of ytterbium thin films, grown on polyimide sheets by DC magnetron sputtering, were studied with X-ray diffraction (XRD) and scanning electron microscopy (SEM). Piezo-resistance characteristics of the ytterbium films under impacts ranging from 1.5 GPa to 2.5 GPa were evaluated in the single stage gas gun. The results show that the piezo-resistance coefficient k depends on grain size of the film. We found that one hour annealing at 300°C significantly improves the ytterbium film quality, by enlarging its grain size, bettering its compactness and reducing its density of defects.
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