Abstract:Tetraethoxyorthosilicate and methacryloxypropyl trimethoxy silane are used to form inorganic and organic networks, respectively. Photosensitive agent is added to initiate free-radical cross-linking polymerization of unsaturated carbon bonds and thus makes the material act as a negative tone photoresist. Developed in dilute base solution, microoptical element, such as lenses and gratings, were fabricated by contact copy with UV-exposure. Shrinkage effect is investigated after optical elements obtained. Compared with the mask, the spacing of the exposed areas in sol-gel film shrinks, and the shrinkage rate is about 20%.

Inorganic-Organic Hybrid Material for Lithography