A Theoretical Model for Neutral Velocity Distributions at a Planar Target in Plasma Source Ion Implantation

DZ Wang
DOI: https://doi.org/10.1063/1.370295
IF: 2.877
1999-01-01
Journal of Applied Physics
Abstract:A theoretical model is developed to study the velocity distributions of neutrals striking a planar target in plasma source ion implantation (PSII) for the case in which the pressure of the gas is large enough that the fast neutrals can be produced in the sheath by ion-neutral charge exchange collisions. An analytic expression for the neutral velocity distribution at the target is provided. The theoretic results agree with Monte Carlo simulations.
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