Optical Proximity Correction in Laser Direct Writing

Jinglei Du,Qizhong Huang,Jun Yao,Yixiao Zhang,Yongkang Guo,Chuankai Qiu,Zheng Cui
DOI: https://doi.org/10.3321/j.issn:0253-2239.1999.07.017
1999-01-01
Abstract:Proximity effect is an important factor which limits optical lithography resolution, and it also limits the applications of laser direct writing system in submicron and half-submicron optical lithography. The production mechanism of proximity effect in laser direct writing was analyzed, and its differences with projection optical lithography and electron beam lithography were described. A convenient and effective optical proximity correction method was presented.
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