A Numerical Approach to Field Electron Emission from a Wide-Gap Thin Film

Dechang Li,Cunzhi Li,Yin-tang Yang,Changchun Zhu

DOI: https://doi.org/10.1109/ivmc.1998.728724

1998-01-01

Abstract:A wide-gap thin film cathode is drafted primarily which is considered to be of high quality and of nm scale. With an anode voltage the thin film an a substrate as the cathode has a double-triangle barrier, so that the electron emission process is similar to the tunneling in a double-barrier diode. According to the quantum theory, the tunneling electrons possessing different energy take different tunneling coefficients through the barrier set. From that the emission I-V characteristics can be integrated correctly. Because the electron distribution at the interface is uncertain, the result here presents the numerical meaning.