Abstract:From the 1980s,our main research results on waveguid grating domain of integrated optics are introduced as follows.The first, we designed and made Lloyd's simple versatile exposure interferometer.In the same installation, it can be formed by adjusting location of column lens to the straight stripe grating of the equal period, the chirped grating or the curve-grating masks on the photoresist, respectively. And then combining with ion or chemical etching the various waveguid grating devices for integrated optics can be fabricated. The set up can also be used to fabricate volume holographic phase Bragg gratings with slant stripe by adjusting (angles) between sample and mirror. This Lloyd's exposure interferometer compared with traditional double-optical path exposure interferometer has the advantages, such as small-sized, versatile, a few of optical elements, shorter optical path, vibration-proof, small angle exposure and so on. So the technique by using Lloyd's exposure to make photoresist grating masks is called standard technique, ane quoted abroad extensively. Up to now. grating devices have successfully been fabricated on varied waveguide materials, such as semiconductors, glasses, polymers and so on, by Lloyd's exposure and ion etching techinque. The second,some research results of the waveguide grating devices in our group since the year 1988 include: (1)The photoresist grating was made on parabolic coupling horns of channel waveguide with 4 μm width of K~+-Na~+ ion exchange CdS_xSe_(1-x) microcrystal glass to form grating limiter of 12 μJ limited energy threshold. (2) DFB optical bistability device was made on CdS_xSe_(1-x) microcrystal glass waveguide with K~+-Na~+ ion exchange by Lloyd's exposure and ion etching technique to obtain bistability switch time of 63 ps and threshold average powe of 77 mW. So devices operating with super fast rate and lower power loss were realized.(3)Chirped grating was made on K~+-Na~+ ion exchange CdS_xSe_(1-x) microcrystal glass wavequide by ion etching to form optical beam scanner. Maximum change quantity of focus location moving was 80 μm in power density of 1.5×10~2 W/cm~2 by using Ar ion laser of 0.514 5 μm wavelength. (4) Poly-layer ZnS/ZnSe thin film (clading) was alternatirely coated on BK7 glass waveguide of Ag~+-Na~+ ion exchange to form nonlinear waveguide grating device. Then optical interconnection with dynamic seek position characteristic with 3 cm linear space can be realized. (5) Interconnection coupling devices with volume holographic phase Bragg grating-light guided board were fabricated on photopolymer with red sensitive to form the grating-splitting board with equal intensity and successfully used for optical butterfly interconnection network of computer. (6)Volume (holographic) phase Bragg grating was fabricated on same glass light guided board to form optical interconnection of the spot to the spot with semiconductor laser 0.78 μm. Its potential application for optical interconnection (between) two printed was indicated. (7) Wavelength-division multiplexed device on monolithic integrated waveguide was made and measured to get complete separation of double-wavelength of 0.632 8 μm and 0.785 μm.

Novel Method For Fabricating Waveguide Grating By Phase Mask Technique

Study of Deep-etched Glass Waveguide Grating

Polymer-waveguide Bragg-grating Devices Fabricated Using Phase-mask Lithography

Interference Lithography Based on a Phase Mask for the Fabrication of Diffraction Gratings

Fabrication of Double-Grooved Gratings Using Coplanar Multibeam Holographic Lithography with a Phase Mask

Light Erasing Method for Fabricating Planar Waveguide Volume Holographic Gratings in Linbo3 : Fe Crystal

High-Efficiency Fabrication of Geometric Phase Elements by Femtosecond-Laser Direct Writing

Silica-Based Arrayed Waveguide Grating With Flattened Spectral Response Using A Multimode Interference Coupler

Research Progreess on Waveguide Gratings for Lntegrated Optics

Fabrication Technology of Polymer Arrayed Waveguide Grating

73‐3: High Refractive Index Photopolymer Fabricated Holographic Grating Used for RGB Waveguide‐type Display

Fabrication of transmission phase gratings by one step direct laser writing

Recording of multiplexed volume gratings via a phase mask for augmented reality waveguides

The Recording Method Of Planar Holographic Grating With Variable Diffraction Efficiency By Phase Modulations

Controlling the Wavefront Aberration of a Large-Aperture and High-Precision Holographic Diffraction Grating

Fabrication of Polymer Optical Waveguides by Digital Ultraviolet Lithography

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Fabrication of grating couplers using submicron silicon mold

Fabrication Of Holographic Photonic Crystal Template With Back Incident Interference Beams

Design of a multiplexing grating for color holographic waveguide

A principle of direct-inscribing diffractive phase devices by linearly polarized light