Fabrication of integrated GeSi/Si superlattice PIN photodetector with waveguide

Na Li,Xuelin Xu,Guozheng Li,Enke Liu,Zumin Jiang,Xiangjiu Zhang,Xun Wang
1998-01-01
Abstract:The GeSi/Si superlattice structure is grown on the n+/n- Si wafer by molecular beam epitaxy method. The detector and Si rib waveguides are formed by reactive ion etching. The integration of Si waveguide and GeSi/Si superlattice PIN photodetector is performed. The maximum overall quantum efficiency of the photodetector is 14.2%, while the working wavelength is 1.3 μm.
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