In-situ measurement of optical film thickness in vacuum device fabrication

Yunsheng Qian,Rongguo Fu,Denggao Xu,Benkang Chang
1998-01-01
Abstract:The thickness of optical film is measured in-situ by using optical reflectance coefficient. When the refractivity of the substrate, the refractivity and absorption coefficient of the film and the wavelength of the incident light are known, the dependence of the optical film reflectance on the variations in the film thickness can be theoretically calculated and plotted in the optical reflectance coefficient curves. The thickness of the growing film at any stage can be obtained by comparing the experimental optical reflectance coefficient curve with the theoretical one. This method is useful for vacuum device fabrication.
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