Film thickness measurement by double-wavelength infrared transmittance method

Jingwen Li,Zhen Hua,Jiao Bai,Qian Zhou,Xiaohao Wang,Kai Ni,Xinghui Li
DOI: https://doi.org/10.1117/12.2601188
2021-01-01
Abstract:Thickness measurement for the optical thin films is very important for the industries of mechanics, printing, battery and so on. Infrared transmittance method is a very useful method to achieve the physical response, which is related to the film thickness according to the Lambert-Beer law. A detail measurement system is designed with two light paths of reflectance and transmittance, consisting of the light source, filter motor, beam splitter, paraboloid mirror, PbSe detector, and so on. An experimental setup is also established with two different infrared wavelengths by two different bandpass optical filters. The stability of the measurement system is tested to be only about 0.3% in 10 min. The experiments show the feasibility of the proposed double-wavelength infrared transmittance method for film thickness measurement.
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