Structure and Grain-Size Distribution of Tio2/Sio2 Thin Film

JW Zhai,LB Kong,LY Zhang,X Yao
DOI: https://doi.org/10.1109/ise.1996.578196
1996-01-01
Abstract:Structure and crystal grain size distribution along tile: thickness of TiO2/SiO2 thin films prepared by Sol-gel process under various heat treatment temperatures were studied. The Xray diffraction spectra demonstrate that the crystallization temperature of anatase is 660 degrees C for 50TiO(2)/50SiO(2) thin-film. At 900 degrees C tridymite-M and rutile structures appeared. The anatase transformation into rutile at 950 degrees C. DTA curves show that the structural transformation of TiO2 is a gradual process, X-ray glancing incidence analyses indicate that the crystal grain size decreases along the thickness of the thin-film. With heat treatment temperature increased, the difference of crystal grain size along the thickness is enhanced.
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