Finite element method for strong free convection fluid ---for chemical vapor deposition reactors

Ping Ding,Yujing Yang,Xiaomeng Zhu,Weikang Yuan
1994-01-01
Abstract:A model of Chemical Vapor Deposition Reactors with a system of TiN deposition in a vertical cold-wall reactor. The model including the fluid flow, heat and mass transfer can well be used in a strong free convection fluid. The problem is solved numerically by the finite element method, using a velocity-pressure formulation for the momentum equations. The dependence of density, viscosity, thermal conductivity and diffusion coefficient on temperature is considered. The distributions of velocity, temperature, TiCl4 concentration in the reactor and the deposition rate of TiN on the substrate surface are predicted. The computational results are in good agreement with the experimental data.
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