Abstract:Three kinds of bilayer films, i.e. aluminum (Al)/fluorine-doped tin oxide (FTO), copper (Cu)/FTO and silver (Ag)/FTO, are prepared by coating a commercial FTO glass with sputtered metal layers, and subsequently thermally annealed. Then all the as-annealed bilayer films are irradiated using a 532 nm nanosecond pulsed laser. X-ray diffraction (XRD) analysis confirms that all the laser-irradiated films have underwent laser annealing, resulting in an improvement in their photoelectric properties. More significantly, after laser irradiation, the as-annealed Ag/FTO film exhibits the highest increment in average transmittance (400–800 nm) that is increased from 72.6% to 80.5%. This should be attributed mainly to the formation of laser-induced grating structures that have anti-reflection effect on their surfaces. It is also found that the laser irradiation decreases the sheet resistance of the as-annealed Ag/FTO film from 5.6 to 5.3 Ω/sq. The annealing caused by thermal effect of laser irradiation gives rise to an increase in grain size, thereafter reduces carrier scattering at grain boundaries and enhances carrier mobility, which should be responsible for the improvement in conductivity. The calculated results show that after laser irradiation the figure of merit of the as-annealed Ag/FTO film is greatly increased from 0.73×10-2 to 2.16×10-2Ω-1, indicating a significant enhancement in the overall photoelectric property of the film. Laser irradiation can simultaneously achieve fabrication of grating structures and laser annealing, providing a new idea for performance optimization of metal-layer-composited transparent conductive films.

Improvement in Overall Photoelectric Properties of Ag/Fto Bilayer Thin Films Using Furnace/Laser Dual Annealing

Effects of Laser Irradiation on the Photoelectric Properties of Thermal-Annealed Metal/Fluorine-Doped Tin Oxide Transparent Conductive Films

Effect of Ag layer thickness and scan line spacing during laser annealing of Ag/F-doped SnO2 bilayer composite thin films under ultrasonic vibration assistance

Introduction of Ag nanoparticles and AZO layer to prepare AZO/Ag/FTO trilayer films with high overall photoelectric properties

Ni/FTO bilayer thin films with high photoelectric properties optimized by magnetic-field-assisted laser annealing

Surface Morphology and Photoelectric Properties of Fluorine-Doped Tin Oxide Thin Films Irradiated with 532 Nm Nanosecond Laser

Laser-assisted Preparation and Photoelectric Properties of Grating-Structured Pt/FTO Thin Films

Effect of Annealing on the Morphology,Structure and Photoelectric Properties of AZO/Pt/FTO Trilayer Films

Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films

Enhanced Visible Light Response of ZnO Porous Thin Film by Post-Annealing Treatment

Effects of nanosecond laser irradiation on photoelectric properties of AZO/FTO composite films

A comparative study of different M(M=Al, Ag, Cu)/FTO bilayer composite films irradiated with nanosecond pulsed laser

Titanium dioxide-coated fluorine-doped tin oxide thin films for improving overall photoelectric property

Improving the performance of nickel-coated fluorine-doped tin oxide thin films by magnetic-field-assisted laser annealing

Effects of Post Annealing Atmosphere on Electrical and Optical Properties of SnO2：F Thin Films

In Situ Optical Characterizations of the Annealing Effects Upon Sno2: F Films by Spectroscopic Ellipsometry

Femtosecond Laser Annealing of Fluorine-doped Tin Oxide Films towards High-performance Perovskite Photovoltaics

Optoelectronic and structural properties of multilayer oxide/silver/oxide transparent conducting electrodes using green laser annealing

Effects of Post Annealing Atmosphere on Low-emission of SnO2: F Thin Films

Two-Step Preparation of Laser-Textured Ni/Fto Bilayer Composite Films with High Photoelectric Properties

Effects of Annealing Process on Characteristics of Fully Transparent Zinc Tin Oxide Thin-Film Transistor