Abstract:Diluted magnetic semiconductors (DMSs) have numerous potential applications, particularly in spintronics. Therefore, the search for advanced DMSs has been a critical task for a long time. In this work, room-temperature ferromagnetism is observed in the C+-implanted AlN films with C+ doses of 5x1016 (AlN:C5x1016) and 2x1017 cm-2 (AlN:C2x1017). AlN:C2x1017 exhibits a saturation magnetization of similar to 0.104 emu/g, nearly 1.5 times that of AlN:C5x1016. X-ray diffraction and X-ray photoelectron spectroscopy (XPS) measurements reveal that the implanted C+ ions occupy the interstitial lattice sites and substitute at the sites of Al atoms. XPS and Doppler broadening of positron annihilation radiation measurements demonstrate the existence of the Al-vacancy related defects in the C+-implanted AlN films. First-principles calculations indicate that the ferromagnetism in AlN:C5x1016 and AlN:C2x1017 is mainly originated from defect complexes involving interstitial C atoms and Al vacancies, which have the lowest formation energy among AlN:C defects containing C atoms and Al vacancies. This work provides a feasible route to develop advanced DMSs.

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