Large‐area, Catalyst‐free Heteroepitaxy of InAs Nanowires on Si by MOVPE
M. Cantoro,G. Wang,H. C. Lin,A. V. Klekachev,O. Richard,H. Bender,T. -G. Kim,F. Clemente,C. Adelmann,M. H. van der Veen,G. Brammertz,S. Degroote,M. Leys,M. Caymax,M. M. Heyns,S. De Gendt
DOI: https://doi.org/10.1002/pssa.201026396
2011-01-01
Abstract:In this paper, we show the results of experiments of InAs nanowire (NW) growth on (111)-oriented Si wafers. The NWs, grown at 620 degrees C by metal-organic vapor-phase epitaxy, are vertically aligned and similar to 30 nm in diameter. Their structural properties are studied by transmission electron microscopy, evidencing a polytypic character, and the vibrational properties by Raman spectroscopy. An assessment of their electrical transport properties is carried out by measuring back-gated, single InAs NW field-effect transistors. The absence of a catalyst ensures the compatibility of the NW growth process with current CMOS technology. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim