An efficient In0.30Ga0.70N photoelectrode by decreasing the surface recombination centres in a H2SO4 aqueous solution

Mingxue Li,Wenjun Luo,Qi Liu,Zhe Zhuang,Zhaosheng Li,Bin Liu,Dunjun Chen,Rong Zhang,Tao Yu,Zhigang Zou
DOI: https://doi.org/10.1088/0022-3727/46/34/345103
2013-01-01
Abstract:The surface treatment of In0.30Ga0.70N photoelectrode in different acid electrolytes (HCl, HBr and a H2SO4 aqueous solution) has been investigated. The highest photocurrent is obtained after the surface treatment in H2SO4 aqueous solution. After H2SO4 treatment, the In0.30Ga0.70N photoelectrode responds to 550 nm and the maximum incident photon-to-current efficiency reaches about 58% under 400-430 nm, which is higher than the previous highest value (42%) on an InGaN photoelectrode. A possible mechanism is also proposed to explain the reason for the highest photocurrent enhancement after H2SO4 surface treatment. The results of the x-ray photoelectron spectroscopy, the inductively coupled atomic emission spectroscope and the electrochemical impedance spectra suggest that the surface segregation layer, as recombination centres of photo-generated holes and electrons, is decreased after H2SO4 surface treatment.
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