Silicon Carbide Pinched Barrier Rectifier (PBR)

Chaofeng Cai,Li Zhang,Na Ren,Kuang Sheng
DOI: https://doi.org/10.1109/ispsd.2013.6694472
2013-01-01
Abstract:In this paper, a new rectifier structure in silicon carbide (SiC) is presented for the first time. The proposed structure involves neither Schottky contact nor minor carrier injection via P-N junction. With adjacent P+ areas placed sufficiently close, pinched barrier is formed for rectifier purpose. Numerical simulations are carried out to verify its function, and optimize its performance. Based on the simulation results, a good trade-off can be achieved between forward drop and reverse leakage, provided that this new structure offers flexibility of controlling onset voltage by adjusting channel parameters continuously.
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