Abstract:Anion doping of tungsten trioxide by nitrogen is used to obtain electrochrome cathode materials, the spectral transmittance of which can be controlled by the doping level. A series of samples was synthesized by reactive magnetron sputtering of a metal tungsten target in a mixture of argon, nitrogen, and oxygen gases, the flow rate of the latter was varied at a constant pressure of the gas mixture. Warm-colored tungsten oxynitride films were prepared at higher doping levels with their morphology and elemental composition characterized using scanning electron microscopy, crystal structure described using X-ray diffraction and the valence state of constituents revealed with X-ray photoelectron spectroscopy techniques. Optical properties were measured by making use of transmission spectrophotometry and spectroscopic ellipsometry. These extensive experimental studies revealed an increase in absorption towards shorter wavelengths below the wavelength of 0.5 μm with an increase in the doping level. At the same time, it was found that with an increase in the doping level, partial reduction of the tungsten occurs, and the fraction of non-stoichiometric oxygen steadily increases to half of the total oxygen content. It is a common belief that the imperfection of the doped material facilitates the intercalation of the material by electrolyte ions.

Effects of Nitrogen Doping on Optical Properties of Tungsten Oxide Thin Films

Electrochromic properties of N-doped tungsten oxide thin films prepared by reactive DC-pulsed sputtering

Influence of N-Doping on Microstructures and Properties of SnO2 Films

Influences of Nitrogen Doping on Optical Properties of TiO2 Film

Effects of Oxygen Partial Pressure on the Structural and Optical Properties of Undoped and Cu-Doped Zno Thin Films Prepared by Magnetron Co-Sputtering

Anion Doping of Tungsten Oxide with Nitrogen: Reactive Magnetron Synthesis, Crystal Structure, Valence Composition, and Optical Properties

Structure, Composition and Evolution of Dispersive Optical Constants of Sputtered Tio2 Thin Films: Effects of Nitrogen Doping

Effect of Sputtering Ambient on The Properties of N Doped ZnO Thin Films

Structure and Properties of Nitrogen-Doped Titanium Dioxide Thin Films Grown by Atmospheric Pressure Chemical Vapor Deposition

An Efficient Method to Modulate the Structure, Morphology and Properties of Wo3 Through Niobium Doping

Nitrogen Chemical State in N-doped Cu2O Thin Films

Optical Properties of Nitrogen-Doped Sno2 Films: Effect of the Electronegativity on Refractive Index and Band Gap

Influence of Nitrogen Doping on Electron Structure and Optical Properties of Amorphous Carbon Thin Films

Effects of Nitrogen Atom Doping on Optical Properties and Dielectric Constant of HfO2 Gate Oxides

Effect of Nitrogen Doping on the Structure and Optical Band Gap of Fluorinated Diamond-Like Carbon Films

Electrical and optical properties of N-doped SnO2 thin films prepared by magnetron sputtering

Nitrogen Doping in Cuprous Oxide Films Synthesized by Radical Oxidation at Low Temperature

Effect of nitrogen doping on the photo-catalytic properties of nitrogen doped ZnO tetrapods

Effect of Cr, N co-doping on the structural and optical properties of ZnO thin films deposited by pulsed laser deposition

Effect of Substrate Temperature on the Optical and Electrical Properties of Nitrogen-Doped NiO Thin Films

Influence of Nitrogen and Magnesium Doping on the Properties of Zno Films