Abstract:The demand for ZnO thin films with increased electrical conductivity and high optical transparency suitable for varieties of optoelectronic applications is rising. Aluminum doping enhances conductivity in ZnO crystallites, but adversely affects their optical transparency. Hydrogen is the optimum dopant because its negative effect on the optical properties is marginal. However, hydrogen-related safety measures necessitate utilizing costly flow control devices and observing cumbersome leak detection protocols. Here, we report depositing hydrogen-doped ZnO layers by sputtering Zn under humid oxygen plasma. The electrical conductivity of the produced ZnO layers is controlled by tuning the relative humidity of the input oxygen to the sputtering chamber. This facile method combines the growth and doping steps and can controllably increase the electrical conductivity of the grown layers up to three orders of magnitude, while causing little crystallinity and optical quality deteriorations compared to the layers grown under dry oxygen plasma. It is shown that, unlike analogous undoped ZnO layers, the electrical conductivity of our hydrogen-doped layers is independent from the intensity and frequency of the applied electric field, implying the prevalence of electronic conduction. The presence of both interstitial- and oxygen vacancy-trapped hydrogen atoms is verified; the majority of the introduced dopants assume the latter position. It is shown that both types of donners ionize at room temperature. Our work is anticipated to initiate work on the sputter deposition of other metal oxides under humid oxygen plasmas.

Room temperature deposition of highly conductive and transparent hydrogen and tungsten co-doped ZnO films for thin film solar cells applications

Influence of water content in mixed solvent on surface morphology, wettability, and photoconductivity of ZnO thin films.

Highly conductive and transparent Al-doped ZnO films on glass substrate via incorporating hydrogen at low substrate temperatures

Improvement of Transparent Conductive Properties of GZO/Cu/GZO Tri-Layer Films by Introducing H2 into Sputtering Atmosphere

Optimization of Sputtering Parameters for Deposition of Al-doped ZnO Films by Rf Magnetron Sputtering in Ar+H2 Ambient at Room Temperature

Radio frequency magnetron sputtering deposition of low-resistivity and broad-spectral transmission F and Al co-doped ZnO film with mobility exceeding 50 cm2 V−1 s−1

Effects of hydrogen treatment and substrate temperatures on the properties of Al-doped ZnO films

The properties of surface textured ZnO:Al films grown in hydrogen atmosphere

The fabrication and application of ZnO:Al thin films in low-frequency inductively coupled plasma fabricated silicon solar cell

Highly Surface-Textured and Conducting Zno:Al Films Fabricated from Oxygen-Deficient Target for Cu(In, Ga)Se-2 Solar Cell Application

Preparation of Aluminum Doped Zinc Oxide Films with Low Resistivity and Outstanding Transparency by a Sol–gel Method for Potential Applications in Perovskite Solar Cell

Effects of substrate temperature on the efficiency of hydrogen incorporation on the properties of Al-doped ZnO films

Sputter deposition of hydrogen-doped ZnO layers under humid oxygen plasma

Hydrogen incorporation induced metal-semiconductor transition in ZnO:H thin films sputtered at room temperature

Highly Surface-Textured ZnO:Al Films Fabricated by Controlling the Nucleation and Growth Separately for Solar Cell Applications

High-performance Ti and W co-doped indium oxide films for silicon heterojunction solar cells prepared by reactive plasma deposition

High-Performance Thin-Film Transistors with ZnO:H/ZnO Double Active Layers Fabricated at Room Temperature

High Performance AZO Thin Films Deposited by RF Magnetron Sputtering at Low Temperature

Inductively Coupled Hydrogen Plasma Processing of AZO Thin Films for Heterojunction Solar Cell Applications

Transparent and conductive Ga-doped ZnO films grown by RF magnetron sputtering on polycarbonate substrates

Thickness Study of AZO Films by RF Sputtering in Ar + H2 Atmosphere at Room Temperature