Enhanced Sulfur Resistance of Ni/Sio2 Catalyst for Methanation Via the Plasma Decomposition of Nickel Precursor

Xiaoliang Yan,Yuan Liu,Binran Zhao,Yong Wang,Chang-jun Liu
DOI: https://doi.org/10.1039/c3cp50694k
2013-01-01
Abstract:A Ni/SiO2 catalyst was prepared by the plasma decomposition of a nickel precursor via dielectric barrier discharge (DBD). The obtained Ni/SiO2 catalyst shows an enhanced H2S resistance for methanation of syngas (CO + H-2). The plasma decomposition has a significant influence on the structural property of Ni/SiO2. The plasma decomposed catalyst shows less defect sites on Ni particles. The formation of Ni-sulfur species was effectively inhibited. The mechanism of H2S poisoning on different catalysts with and without plasma decomposition was also discussed according to the reaction temperature.
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